Challenges in MEMS Technology
نویسندگان
چکیده
منابع مشابه
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CMOS micromachining processes are being increasingly used to fabricate integrated MEMS devices. Verification of such designs requires extraction from layout to mixed domain circuits and MEMS schematics for lumped parameter simulation. The higher etch hole density and multilayer interconnect in CMOS-MEMS designs results in a larger and more complex problem than in polysilicon MEMS. In addition, ...
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ژورنال
عنوان ژورنال: Strain
سال: 2007
ISSN: 0039-2103,1475-1305
DOI: 10.1111/j.1475-1305.2007.00405.x